The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1981
Filed:
Oct. 25, 1978
Applicant:
Inventors:
Gary L Nelson, Eagan, MN (US);
William A Harvey, Minneapolis, MN (US);
Assignee:
Sperry Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C30B / ;
U.S. Cl.
CPC ...
156624 ; 156D / ;
Abstract
A rinse process for solvating adhered primary melt residue from magnetic garnet crystals grown via liquid phase epitaxial (LPE) techniques. The rinse melt consists of a mixture having a saturation to nucleation temperature range that encompasses the primary melt's growth temperature and a solvent compound different from that used in the primary melt, which will solvate the solvent used in the primary melt and will not produce undesirable rinse melt adhesion.