The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1981
Filed:
Oct. 12, 1979
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A novel process is proposed for the preparation of vinyl chloride based resins modified with a polymer latex, according to which the latex polymer is absorbed so completely and uniformly on the polyvinyl chloride resin that the effect of the modification of the resin properties is remarkably enhanced along with no adverse effects on the particle size distribution of the resin product and no effluence of the latex into the waste water discharged in the dehydration of the aqueous polymerizate slurry after completion of the polymerization. The process of the invention comprises introducing the modifier polymer latex into the polymerization mixture only when the monomer conversion is in the range from 30 to 95% and introducing an inorganic fine powder such as fume silica, bentonite and diatomaceous earth into the polymerization mixture at the same time as or before the introduction of the modifier polymer latex.