The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 09, 1981

Filed:

Mar. 15, 1978
Applicant:
Inventors:

Philip T Dempster, St. Helena, CA (US);

John Y Pun, St. Helena, CA (US);

Assignee:

Cavitron Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01F / ;
U.S. Cl.
CPC ...
7386142 ; 73717 ; 128725 ;
Abstract

The pressure difference across a pneumotach restriction is sampled with a gas chopper connected across a pressure difference detecting transducer. The gas chopper alternates the pressures backward and forward in application to the transducer so that the latter develops an AC sampling signal, the strength of which is related to flow. This AC signal is sampled in synchronism over intervals having a duration related to the power line frequency to develop an integrated value of the pressure difference free of drift caused by power line interference. The resultant signal is smoothed and summed in alternating response at double the gas chopper sampling rate to give a smooth output which is then multiplied by a linearizing circuit to obtain a flow signal which is proportional to the pressure difference. Specific gas flow structures and electronic sampling circuitry are disclosed.


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