The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1981
Filed:
Apr. 16, 1980
Applicant:
Inventors:
Vito A DePalma, Tonawanda, NY (US);
Anne E Meyer, Tonawanda, NY (US);
Albert K Ashby, Lancaster, NY (US);
Assignee:
Calspan Corporation, Buffalo, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 58 ; 118 53 ; 427 96 ; 427122 ; 427123 ; 427240 ; 427358 ;
Abstract
Uniform and repeatable formation of a resistance element on a substrate is achieved by spinning the coated objects which are still in a wet state while rotating them about an orthogonal axis to subject the wet indicator formulation to centrifugal forces which forces the indicator formulation into contact with the substrate.