The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 1981

Filed:

Apr. 07, 1980
Applicant:
Inventor:

James A Merritt, Pulaski, TN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
2041 / ;
Abstract

Disclosed is a method to synthesize Si.sub.3 N.sub.4 from SiX.sub.4 +NX.s3, wherein X is selected from hydrogen and/or fluorine, by laser photochemical reaction (LPR) technique in a controlled atmosphere chamber wherein the reactant gases are maintained at pressures between about 10 and about 200 torr in a molar volume ratio of about 3 of the SiX.sub.4 to about 4 of the NX.sub.3. The LPR method produces the compound Si.sub.3 N.sub.4 at room temperature while employing a pulsed laser or a continuous wave laser.


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Merritt, James. (1981). Laser photochemical synthesis of si.sub.3 n.sub.4 (U.S. Patent No. 4270997). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4270997

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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