The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1981
Filed:
Jan. 30, 1979
John C Herper, Glen Cove, NY (US);
John J Stangel, Mahopac, NY (US);
Sperry Corporation, New York, NY (US);
Abstract
An antenna and a method for obtaining predetermined far field antenna patterns is disclosed. Empirical adjustments of a focal region feed system provides for the compensation of tolerance or other imperfections of the antenna to achieve the desired far field pattern. An element of the feed system is adjusted when the antenna is angularly positioned, with respect to a receiving element in the far field, which corresponds to the location of the element in the feed array. A desired far field pattern may also be achieved by illuminating the antenna aperture, either simultaneously or sequentially, by several plane waves, the amplitude and incident angles of which are carefully controlled, measuring the phase and amplitude of the focal region distribution caused by this illumination, and designing the feed system to establish a focal region distribution that is the complex conjugate of that measured.