The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1981
Filed:
Mar. 06, 1980
Applicant:
Inventors:
Armand Eranian, Paris, FR;
Jean C Dubois, Paris, FR;
Andre Couttet, Paris, FR;
Evelyne Datamanti, Paris, FR;
Assignee:
Thomson-CSF, Paris, FR;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430-5 ; 430270 ; 430296 ; 430326 ; 20415922 ; 526245 ; 426292 ;
Abstract
The invention relates to resins used for manufacturing or reproducing masks in electronics. The photomasking composition corresponds to the general formula: ##STR1## in which R.sub.1, R.sub.1 ', R.sub.1 ', R.sub.2, R.sub.2 ', R.sub.2 ' designate alkyl radicals whose principal chain contains from 1 to 10 carbon atoms, the symbols F, Cl and Br which designate the fluorine, chlorine and the bromine bearing indices a, b, c, a', b', and c' representing the number of these atoms which are zero or positive whole numbers, such as m, n, p.