The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1981
Filed:
Jul. 30, 1976
Applicant:
Inventors:
Eugene S Poliniak, Willingboro, NJ (US);
Nitin V Desai, Edison, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
430270 ; 427 431 ; 430296 ; 430324 ; 430326 ;
Abstract
This invention pertains to an electron beam resist method for forming a surface relief pattern in a poly(oelfin sulfone) layer wherein the polymer layer is useful for depositing a metal film thereon and thereby forming a corresponding surface relief pattern in the metal film. The surface relief pattern is formed using poly(3-methyl-1-cyclopentene sulfone) as the poly(olefin sulfone) layer and using a mixture of cycloheptanone and 2-methylcyclohexanol or a mixture of 2-methylcyclohexanone and 3-methylcyclohexanol as the developer for the poly(3-methyl-1-cyclopentene sulfone) layer.