The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 1981

Filed:

May. 30, 1979
Applicant:
Inventors:

Gerhart K Gaule, Elberon, NJ (US);

John C Yarwood, Madison, CT (US);

Derek E Tyler, Cheshire, CT (US);

Ik Y Yun, Orange, CT (US);

Assignee:

Olin Corporation, New Haven, CT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22D / ; B22D / ;
U.S. Cl.
CPC ...
164 49 ; 164147 ;
Abstract

A duplex impedance shield is disclosed which is used to effect improved shape control in the electromagnetic casting of molten metal or alloy. The shield is provided with a primary loop which substantially surrounds the upper portion of an electromagnetic casting station and a secondary loop attached thereto which serves to enlarge the air gap enclosed by the shield thereby increasing the impedance of the shield. The secondary loop of the shield may be provided with shunt means which can be manipulated to vary the inductance and/or the resistance of the shield thereby varying the impedance of the shield.


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