The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1981
Filed:
Mar. 13, 1978
Applicant:
Inventors:
Eugene R Astley, Bellevue, WA (US);
Harold K Forsen, Bellevue, WA (US);
Assignee:
Jersey Nuclear-Avco Isotopes, Inc., Bellevue, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 250281 ;
Abstract
Method and apparatus for sputtering particles of plural isotope types to produce a particle flow of the plural isotope types into a region where laser radiation is generated to produce isotopically selective ionization of at least one isotope type in the sputtered particle flow. Separate collection of the ionized particles is accomplished through application of a magnetic field in the region of ionization and beyond.
Astley, Eugene. (1981). Sputtered particle flow source for isotopically selective ionization (U.S. Patent No. 4264819). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4264819
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile