The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1981
Filed:
Jun. 11, 1979
Applicant:
Inventor:
Gunter E Trausch, Munich, DE;
Assignee:
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430320 ; 430324 ; 430394 ; 430396 ;
Abstract
A process for the manufacture of precision flat parts such as masks, templates, and the like having very small openings therein with high contour details yet with substantial material thickness utilizes a metallized glass carrier having a stencil etched thereon with a negative working photo resist laminated on it. Exposure of photo resist is achieved through the glass so that maximum intensity of light in the photo resist occurs at the juncture between the photo resist and the glass carrier for maximum adhesion. Irregularly shaped apertures can be generated by selective varied orientation of the glass carrier during the exposure.