The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 1981
Filed:
May. 29, 1979
Applicant:
Inventor:
Shi-Kay Yao, Anaheim, CA (US);
Assignee:
Rockwell International Corporation, El Segundo, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350 9619 ; 3501 / ;
Abstract
A high-throughput diffraction-limited Bragg diffraction grating having a variable periodicity functions as a lens for optical guided waves. The lens may be fabricated with planar photolithograhic techniques. It has predictable focusing properties which are insensitive to process variations making it particularly useful for mass production of integrated optical systems.