The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 1981
Filed:
Mar. 07, 1980
Applicant:
Inventors:
Raymond E Jaeger, Basking Ridge, NJ (US);
John B MacChesney, Stirling, NJ (US);
Thomas J Miller, Greenbrook, NJ (US);
Assignee:
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 39 ; 427 451 ; 427 47 ; 427237 ; 427238 ; 4273762 ;
Abstract
The modified chemical vapor deposition process is practiced using an rf source as the external heat source. An rf plasma is thus established within a glass tube through which appropriate glass precursor vapors are passed. As a result of the ensuing chemical reactions, particulate material is formed within the tube and deposits on it. The hot plasma zone may be used to consolidate this particulate material into a transparent glass, and onto the interior wall of the tube. The tube is subsequently drawn into an optical fiber.