The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1981
Filed:
Jun. 04, 1979
Applicant:
Inventor:
Abraham Goldman, Kendall Park, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430-5 ; 1566591 ; 430313 ; 430318 ; 430323 ; 430331 ; 427 96 ; 427338 ; 106138 ; 264129 ;
Abstract
The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride-based etchant solutions is increased by treating the photoresist pattern with a methylene blue solution, containing at least 0.1 weight percent methylene blue, prior to exposure to the etchant solution.