The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 1981
Filed:
Feb. 28, 1978
Armand Eranian, Paris, FR;
Jean-Claude Dubois, Paris, FR;
Maryse Gazard, Paris, FR;
Francoise Barre, Paris, FR;
Thomson-CSF, Paris, FR;
Abstract
A family of negative resins, capable of undergoing crosslinking under the effect of more or less energetic photons (gamma radiation, X-rays, ultraviolet or visible light), applicable to the protection of objects against atmospheric agents and to the production of masks of the type used in the production of integrated circuits. The typical compound according to the invention contains at least one substance of which the chemical formula comprises a thiirane ring: ##STR1## such as 2,3-epithiopropyl methacrylate copolymerized with a vinyl monomer, such as methyl methacrylate. Crosslinking is facilitated by photoinitiators, such as aryl diazonium and aryl iodonium salts liberating Lewis acids. By selecting the photoinitiator, it is possible to act on the spectral region where irradiation is effective.