The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1981
Filed:
Oct. 02, 1979
Raymond V Johnson, Tequesta, FL (US);
Dennis P Biondi, Palm Beach Gardens, FL (US);
RCA Corp., New York, NY (US);
Abstract
A diffusion furnace having particular utility in the processing of SOS devices wherein a temperature gradient, per unit length of furnace tube, is provided at a section of a reaction tube extending between the furnace and the scavenger and load-unload chambers in order to minimize the thermal shock to which a sapphire wafer may be subject, either at the commencement of processing when the wafer is first introduced into the furnace or at the conclusion of the processing as the wafer is being withdrawn from the furnace.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile