The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 1981

Filed:

Jun. 01, 1979
Applicant:
Inventor:

John W Soehngen, Berkeley Heights, NJ (US);

Assignee:

Celanese Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ; B29C / ;
U.S. Cl.
CPC ...
264145 ; 264154 ; 2642888 ; 2642893 ; 264D / ;
Abstract

Microporous films having improved morphological structure are prepared by the 'solvent stretch' method from an olefinic precursor film having a controlled crystalline structure. The crystalline structure of the precursor film is controlled by preparing said film from an olefinic crystalline homopolymer characterized as having a melt index of about 3 to about 20 in the absence of a nucleating agent and a molecular weight distribution ratio of about 3.8 to about 13. In another embodiment the crystalline structure of the precursor film is controlled by incorporating a nucleating agent into the crystalline polymer resin from which the precursor film is prepared which thereby permits a reduction in the melt index of the polymer to about 0.3.


Find Patent Forward Citations

Soehngen, John. (1981). Solvent stretch process for preparing microporous films from precursor (U.S. Patent No. 4255376). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4255376

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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