The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 1981
Filed:
Aug. 08, 1979
Carmine F Vasile, Thousand Oaks, CA (US);
Rockwell International Corporation, El Segundo, CA (US);
Abstract
Disclosed is a method for evaluating a discontinuity in an object. As used to measure the depth of a surface discontinuity in a plate type of object, the method includes the steps of generating a horizontally polarized shear wave in the object directed substantially along the axis of the discontinuity, passing the generated wave through an aperture to diffract the wave prior to its arrival at the discontinuity, detecting the wave after it has propagated through the discontinuity, and calculating the depth of the discontinuity by correlating the phase and amplitude of the detected wave to the phase and amplitude of a similar wave propagated in a region of the object which is free of discontinuities.