The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 10, 1981
Filed:
May. 11, 1979
Applicant:
Inventors:
John R Viertl, Schenectady, NY (US);
Marshall G Jones, Scotia, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
73783 ;
Abstract
Residual stress measurements are made using a strain gage and stress relief achieved by local melting of a region of the object being tested by a laser beam or other finely directed heat source. Surface strain is measured dynamically before the heat of the molten region diffuses under the gage and results in thermal stress. The method is semi-nondestructive because the molten region recasts with little loss of material, is rapid, and can be utilized on difficult geometries such as the interior surface of reactor pipe.