The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 1981
Filed:
Nov. 18, 1977
Mitsuru Oikawa, Tokyo, JP;
Hitachi, Ltd., , JP;
Abstract
A method for producing a master pattern used for manufacture of a color picture tube phosphor screen is disclosed. An image of an interchangeable shadow mask is formed on the internal surface of the face glass and transferred onto a photosensitive plate, thereby producing a master pattern with a very high accuracy. In the case of a very thin photosensitive plate, the master pattern is produced directly from the interchangeable shadow mask. The method for producing a color picture tube by use of a master pattern involves equipment much lower in cost and easier in manufacturing processes than the conventional methods due to the facts that exposure by flood light is possible and that the shadow mask and the face glass need not be handled as a couple.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile