The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 1981

Filed:

Apr. 17, 1978
Applicant:
Inventors:

Yutaka Takemoto, Chiba, JP;

Syozo Senguro, Ichihara, JP;

Masayoshi Nitta, Ichihara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
528501 ; 5263442 ; 528502 ; 528503 ;
Abstract

A process is provided for reducing the concentration of vinyl chloride monomer in a polymerized slurry obtained by the suspension-polymerization of vinyl chloride alone or a mixture of vinyl chloride with a monomer copolymerizable therewith, the improvement characterized in that a polymerized slurry at a temperature between 40.degree. C. and 100.degree. C. is jetted and/or flowed down into the gas phase portion of a vessel maintained at a pressure below atmospheric pressure.


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