The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 1981

Filed:

Nov. 30, 1979
Applicant:
Inventor:

Bernard R Tuft, Scipio Center, NY (US);

Assignee:

General Electric Company, Auburn, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; H01L / ;
U.S. Cl.
CPC ...
427 91 ; 156643 ; 156645 ; 156646 ; 156657 ; 2041 / ; 427309 ;
Abstract

A method for forming an electrode on a semiconductor device is described. Where surface adjacent regions of differing dislocation densities are present, an initial mechanical abrading step followed by a plasma etching step produces a surface to which a metal layer may be applied with relatively uniform adherence characteristics.


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