The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 1981
Filed:
Apr. 30, 1979
Applicant:
Inventor:
Lucian A D'Asaro, Madison, NJ (US);
Assignee:
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156636 ; 156345 ; 156662 ;
Abstract
A method for thinning and polishing semiconductor materials such as gallium arsenide is disclosed. This method utilizes a chemical etchant in conjunction with a grooved flat polishing plate. The polishing plate has a hardness greater than 2 on the mohs scale. High quality polished surfaces are obtained. Exemplary of polishing plate materials is quartz.
D'Asaro, Lucian. (1981). Process for the chemical etch polishing of semiconductors (U.S. Patent No. 4244775). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4244775
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile