The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 1981
Filed:
Jan. 30, 1979
Rolf Wengert, Munich, DE;
Wilhelm Huber, Goldach, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A double mask raster method for application of a number of different slurries in a discrete pattern, to produce a raster such as can be used in color television picture tubes, has a first mask having a plurality of apertures therein which remains immovably on the substrate throughout the application of all slurries. A separate second mask having a smaller number of aligned apertures therein is utilized with each successive application of a different slurry, allowing the slurry to penetrate the two masks to the substrate only where apertures in the two masks are aligned. The method may be used to apply slurries to flat or curved substrates in a vertical or horizontal position adapted for conventional spraying, or by means of electrostatic spraying.