The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 1981

Filed:

Feb. 02, 1979
Applicant:
Inventors:

Hidenori Nomura, Tokyo, JP;

Hiroshi Honmo, Tokyo, JP;

Shigeo Matsushita, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B / ;
U.S. Cl.
CPC ...
65-2 ; 65 / ; 65 / ; 65 67 ; 264-1 ; 264158 ; 427163 ; 4272552 ;
Abstract

There is disclosed a method of producing dielectric diffraction gratings. This method comprises (a) preparing a preform by forming one upon another layers of two or more glasses having different refractive indices at a given period, and (b) cutting the preform into flat pieces.


Find Patent Forward Citations

Nomura, Hidenori. (1981). Method of producing dielectric diffraction gratings or dielectric (U.S. Patent No. 4243398). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4243398

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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