The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 1980
Filed:
Mar. 20, 1979
Masahiro Niinomi, Yokohama, JP;
Kenji Yanagihara, Atsugi, JP;
Japan Synthetic Rubber Co., Ltd., Tokyo, JP;
Abstract
In a plasma chemical reaction carried out with at least one gas, the plasma constants in the progress of reaction such as electron temperature, electron density and electron energy distribution function can be measured by use of a probe heated to a high temperature which is made of a metal having a small thermionic electron emission at a high temperature. The plasma chemical reaction can be performed in the steady state with satisfactory reproduction of composition, structure, yield and performance of the product by controlling the pressure, input power and gas flow rate in the plasma reactor so that the measured plasma constants always coincide with the predetermined plasma constants necessary for effecting the intended chemical reaction which have been obtained through a preliminary experiment.