The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 1980
Filed:
Oct. 01, 1979
Hendrik Ensing, Velden, NL;
Oce-Nederland B.V., Venlo, NL;
Abstract
An improved process for transferring a magnetizable developing powder from an insulating substitute, such as an electrostatic duplication master or photoconductive element to a receiving material, such as paper, in electrostatic image development enables the transfer of powder having a specific resistance greater than 10.sup.13 Ohm.cm. without the need for specially treated paper. The powder is applied imagewise, corresponding to a charge image, on an insulating substrate, the substrate with the powder image brought in contact with the receiving material to which the powder is to be transferred, two separate charges are applied to the free side of the receiving material during the period of contact with the substrate, the first of such charges, a pre-transfer charge, having a polarity opposite to that of the charge image and the second of such charges, a transfer charge, being greater than the first and having the same polarity as that of the charge image, and the powder transferred. Advantageously, the first charge is between 0.08 to 0.17 .mu.C per cm.sup.2., the second charge is at least 0.5 .mu.C per cm.sup.2. and the charges are applied within 0.5 second after each other. Transfer yields of 85 percent may be obtained and the receiving material may be ordinary paper with a surface resistance between 5.times.10.sup.9 to 10.sup.11 Ohm per square.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile