The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1980
Filed:
May. 11, 1979
Applicant:
Inventors:
Andre Barraud, Bures-sur-Yvette, FR;
Jean Messier, Gif-sur-Yvette, FR;
Annie Ruaudel, Chatenay-Malabry, FR;
Assignee:
Commissariat a l'Energie Atomique, Paris, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430281 ; 20415922 ; 430271 ; 430311 ; 430313 ; 430321 ; 428411 ;
Abstract
Photosensitive film which can be used in microgravure, wherein it comprises at least one organic monomolecular layer having amphiphilic molecules with at least one irradiation polymerizable function and one aliphatic chain with at least 12 carbon atoms, a polymerizable function being located at the hydrophobic end of said molecules. The photosensitive films can be used with particular advantage in the production of microetched objects, such as optical and holographic systems, integrated optical devices and electronic microcircuits.