The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 1980
Filed:
Apr. 05, 1979
George K Celler, Lawrenceville, NJ (US);
Lionel C Kimerling, Westfield, NJ (US);
Harry J Leamy, New Providence, NJ (US);
John M Poate, Summit, NJ (US);
George A Rozgonyi, Chatham, NJ (US);
Western Electric Company, Inc., New York, NY (US);
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Abstract
A technique isdescribed for removing defects and disorder from crystalline layers and the epitaxial regrowth of such layers. The technique involves depositing short term bursts of energy over a limited spatial region of a material thereby annealing the otherwise damaged material and causing it to epitaxially regrow. Subsequent to the short term energy deposition, similar processing is sequentially effected on adjoining and overlapping regions such that a pattern is ultimately 'written'. This pattern forms a continuous region of essentially single crystal material.