The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 1980
Filed:
Sep. 27, 1978
Victor Wang, Oxnard Beach, CA (US);
Amnon Yariv, San Marino, CA (US);
Hughes Aircraft Company, Culver City, CA (US);
Abstract
A laser which self-corrects for distortions introduced into the laser beam wavefronts by aberrations and time-varying phenomena internal to the laser. The improved laser includes a partially transmissive first reflecting element, an aperture stop, a lasing medium and a nonlinear phase conjugate reflecting device as the second reflecting element. During laser operation, aberrated wavefronts impinging upon the second reflecting element are reflected as the phase conjugate waveform thereof. The aperture stop restricts laser operation to the fundamental mode which allows only corrected, unaberrated waves to pass through the aperture stop and to subsequently exit the laser. Four embodiments are described utilizing stimulated Brillouin scattering (SBS), four-wave mixing, three-wave mixing and photon echo devices as the second reflecting element.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile