The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 1980
Filed:
Aug. 31, 1979
Applicant:
Inventor:
Yunosuke Kawabe, Yokohama, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
148175 ; 29574 ; 2957 / ; 29578 ; 29580 ; 148-15 ; 148174 ; 156626 ; 156647 ; 156649 ; 156653 ; 156657 ; 156662 ; 357 49 ; 357 50 ; 357 54 ; 357 56 ; 357 59 ;
Abstract
A semiconductor device comprises a V-groove isolation structure and an alignment mark having a sharp contour. The alignment mark consists of a locally thick portion of an oxide layer covering an epitaxial layer in which a V-groove is formed. The alignment mark is produced by a thermal oxidizing operation involved in the manufacturing procedure of the V-groove isolation structure.
Kawabe, Yunosuke. (1980). Method of manufacturing semiconductor devices having improved alignment (U.S. Patent No. 4233091). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4233091
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile