The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 1980
Filed:
Mar. 16, 1979
Applicant:
Inventor:
Donald C McCarthy, Delran, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430323 ; 430 23 ; 430313 ; 430318 ; 430331 ;
Abstract
The etch resistance of a casein-based photoresist pattern to low specific gravity ferric chloride based etchant solutions is increased by treating the photoresist pattern with a formaldehyde solution containing at least 10 percent formaldehyde by volume by a period of at least 30 seconds, and thereafter drying the photoresist pattern.
McCarthy, Donald. (1980). Improving etch resistance of a casein-based photoresist (U.S. Patent No. 4230794). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4230794
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile