The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 1980
Filed:
Jul. 27, 1978
Applicant:
Inventor:
John Zajac, San Jose, CA (US);
Assignee:
Davis & Wilder, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ; H01L / ;
U.S. Cl.
CPC ...
156345 ; 2041 / ; 204298 ; 156643 ;
Abstract
An improvement in radial flow parallel plate plasma etchers has been developed in order to improve the uniformity of etching across the entire radial plate dimension. The improvement comprises radially decreasing the spacing between the electrodes wherein the gap between the electrodes is greatest at the center and smallest at the circumference of the electrodes.