The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 1980
Filed:
Dec. 22, 1978
Harold G Parks, Schenectady, NY (US);
General Electric Company, Schenectady, NY (US);
Abstract
An improved magnetic fine deflection system, for use in an electron beam optical system of the type having a single plate matrix lens, utilizes an orthogonal set of stacked deflection-field-generating conductors, with one stacked orthogonal pair of sheet conductors being positioned behind a target, upon which the electron beam is to be focused and deflected, and with a second orthogonal pair of sheet conductors positioned in front of the multi-apertured single plate matrix lens and having apertures in registration with the lenslets. The improved magnetic fine deflection system is utilized in an electron beam optical system having first means for forming a narrow beam of electrons and coarse deflection means associated with the first means for scanning the electron beam to each lenslet of the single plate matrix lens, for passage therethrough and into the magnetic fine deflection field.