The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 1980

Filed:

Mar. 09, 1979
Applicant:
Inventors:

Robert E Harrell, Manchester, MO (US);

Tedd L Harrell, Springfield, MO (US);

Assignee:

Western Litho Plate & Supply Co., St. Louis, MO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03D / ;
U.S. Cl.
CPC ...
354317 ; 354325 ; 118314 ; 118323 ;
Abstract

Apparatus for processing exposed lithographic plates in which an exposed plate is continuously fed forward with the exposed face of the plate facing up, developer is delivered onto the upper face of the plate by a nozzle which is traversed back and forth laterally with respect to the path of the plate above the plate to distribute the developer across the upper face of the plate, the developer is rubbed over the upper face of the plate, the plate is sprayed with water, preservative is delivered onto the upper face of the plate by a nozzle which is traversed back and forth along with the developer delivery nozzle to distribute the preservative across the upper face of the plate, and the preservative is rubbed over the upper face of the plate. The plate is fed forward by sets of plate feed rolls. Water is delivered onto certain of these rolls by nozzles which are traversed back and forth along with the developer and preservative delivery nozzles. Developer and preservative are pumped continuously to the respective nozzles from respective supplies, and developer and preservative not delivered onto a plate are collected and returned to the respective supplies. Water used in processing the plates may be filtered and recirculated, and make-up water added as needed.


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