The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 02, 1980

Filed:

Mar. 28, 1978
Applicant:
Inventors:

Tamotsu Miki, Ichihara, JP;

Shizuo Narisawa, Ichihara, JP;

Hideki Horiike, Ichihara, JP;

Ichiro Ichikawa, Ichihara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
525242 ; 264142 ; 525244 ; 525250 ; 525256 ; 525258 ;
Abstract

By block-copolymerizing a mixture of an aromatic vinyl compound and a conjugated diene in two stages in an aliphatic hydrocarbon solvent, using an organomonolithium compound or an organodilithium compound as a polymerization initiator, a block copolymer is formed as a suspension polymer in a slurry state. The resulting block copolymer is very clear and excellent in mechanical properties, especially, strength, elongation and impact strength. It has a wide application in the field of general resins.


Find Patent Forward Citations

Miki, Tamotsu. (1980). Process for producing block copolymer from conjugated diene and vinyl (U.S. Patent No. 4220738). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4220738

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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