The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1980
Filed:
Feb. 09, 1979
John P Reekstin, Orange, CA (US);
Howard L Glass, Orange, CA (US);
Rockwell International Corporation, El Sequndo, CA (US);
Abstract
There is described a unique mask and method of making same. The mask is especially useful in high resolution fabrication techniques such as in making magnetic bubble domain structures, semiconductor device structures and the like. The mask includes a suitable support of appropriate density to be substantially transparent to various types of radiation such as, but not limited to, E-beams, X-rays and the like. A layer of material which is substantially opaque to the same radiation and which can have the solubility thereof changed by application of E-beams or the like is provided on the support material. The mask is exposed to the solubility changing radiation wherein a pattern is defined in the layer, the layer is etched in a non-critical etch so that the soluble portion thereof is removed and the remaining material provides a suitable pattern. To the extent necessary, a suitable auxiliary support member can be provided to the support.