The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1980
Filed:
Nov. 28, 1978
Senzo Shimizu, Odawara, JP;
Isao Nomura, Hiratsuka, JP;
Motohachi Usui, Odawara, JP;
Masahiro Harada, Hiratsuka, JP;
Mitsubishi Gas Chemical Company, Inc., Tokyo, JP;
Abstract
A process for the isolation of particulate polyarylene esters having good thermal stability and hydrolytic stability, which comprises adding to a solution of a polyarylene ester in an organic solvent a poor solvent for the polyarylene ester at least in an amount such that said solution reaches a cloud point, followed by subjecting said mixed solution to an aging treatment whereby the polyarylene ester precipitates as solids, characterized in that said poor solvent is a mixed poor solvent consisting of 5-95% by weight of an aliphatic alcohol with 1-5 carbons and the other poor solvent for the polyarylene ester, the amount of said mixed poor solvent added being within the range of 100-200% by weight of the amount such that said solution reaches the cloud point and not exceeding the amount of said solution.