The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 1980

Filed:

Aug. 18, 1978
Applicant:
Inventors:

Yoshihito Osada, Yokohama, JP;

Alexis T Bell, Oakland, CA (US);

Mitchel M Shen, Piedmont, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
204165 ; 204168 ; 204169 ;
Abstract

An ionized gas plasma is established in an electrical field in contact with a non-vapor volume of monomer (liquid and/or solid). The plasma creates active polymerization sites in the monomer volume to initiate propagation of polymerization therein. After initiation, the partially-polymerized monomer volume is postpolymerized in the absence of the ionized gas plasma to yield a very high molecular weight polymer which may be essentially free of cross-linking in desirable forms including commercial quantities of bulk self-supporting polymer or a coating. Suitable monomers include liquid vinyl monomers (e.g., methyl, methacrylate) and solid crystalline monomers (e.g., 1,3,5-trioxane).


Find Patent Forward Citations

Loading…