The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 24, 1980

Filed:

Dec. 05, 1978
Applicant:
Inventors:

Takayoshi Masuda, Nagoya, JP;

Tsutomu Takase, Nagoya, JP;

Yoshimoto Watanabe, Nagoya, JP;

Fumio Yamazaki, Nagoya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
568617 ;
Abstract

An improved process for the production of polytetramethylene ether glycol is disclosed. Polytetramethylene ether glycol is obtained with a high yield by subjecting tetrahydrofuran to ring opening polymerization in the presence or absence of an organic solvent with the use of, as a catalyst, a lithium halide in conjunction with fuming sulfuric acid. Average molecular weight of the glycol product can be controlled in the range of 1000-3000 at will by varying the amounts of the lithium halide and fuming sulfuric acid used.


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