The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 27, 1980

Filed:

Feb. 22, 1978
Applicant:
Inventors:

Takehiro Kakizaki, Yokohama, JP;

Susumu Tagawa, Atsugi, JP;

Masahide Sawai, Ebina, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
313437 ; 313439 ;
Abstract

In an electron-optical system of the mixed field type in which magnetic and electric fields are respectively operative to project a focused image of an object of the system upon a target structure and to simultaneously scan such image across the target structure, beam landing errors are eliminated by dimensioning and locating the solenoid for generating the magnetic field and the electrostatic yoke for generating the electric field so that the landing errors due to non-uniformity of the electric field, for example, by reason of field-free regions at the opposite ends thereof, are substantially cancelled by landing errors due to non-uniformity of the magnetic field, for example, as constituted by flare field regions at the opposite ends of the magnetic field.


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