The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 1980
Filed:
Apr. 02, 1979
James R Kitcher, Poughkeepsie, NY (US);
Gunars M Ozols, Wappingers Falls, NY (US);
Bryant N Zingerman, Monroe, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Metal layers, for example; chromium and titanium-tungsten, used in conductive metallurgies as adhesion or barrier layers for integrated circuit devices which are formed in silicon semiconductor substrates, are selectively etched without significant attack on either the silicon substrate or aluminum conductor layers. The metal layers are exposed to a glow discharge formed by imposing an RF voltage across two spaced electrodes in an ambient atmosphere comprising a gaseous mixture of from about 5 to about 20 percent by volume of a polychlorinated organic compound containing one to two carbon atoms, for example, CCl.sub.4 or C.sub.2 HCl.sub.3 and about 80 to about 95 percent by volume of oxygen at a pressure in the range of about 5 to 50 milli-torr.