The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 1980
Filed:
May. 19, 1978
Applicant:
Inventors:
Johannes van der Wal, Eindhoven, NL;
Gijsbertus Bouwhuis, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
331 / ; 350164 ; 350166 ; 350288 ;
Abstract
A gas discharge laser includes one or more birefringent layers in a multi-layer reflector that provides such a large difference in reflection of light polarized linearly in two mutually perpendicular directions that the laser generates 100% linearly polarized light in one direction only. In the other directions the reflection is insufficient to obtain stimulated emission.