The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 1980
Filed:
May. 09, 1977
Lloyd Ewing, Milwaukee, WI (US);
Michael J Bykowski, West Bend, WI (US);
Water Pollution Control Corporation, Milwaukee, WI (US);
Abstract
Drop-back of solids into the drum pool of a rotary microscreen is reduced by applying a limited gas pressure differential across an unsubmerged portion of the screen cloth. The pressure is not for the purpose of increasing the driving force, .DELTA.H, of the liquid passing through the cloth. For purposes of this disclosure, .DELTA.H is the pressure differential existing across the screen below the surface of both the drum pool and tank pool. In fact, assuming other factors remain equal, application of a gas pressure differential to an unsubmerged portion of the screen cloth, with consequent reduction in drum pool suspended solids concentration, will normally reduce .DELTA.H even though the gas pressure also acts on the surface of the drum pool. More significantly, the invention enables operation of a microscreen unit at increased flow capacity at a given .DELTA.H. Whatever pressure is applied, there will be some reduction of torque, bearing load and wear at any given .DELTA.H.