The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 1980
Filed:
Dec. 05, 1977
Applicant:
Inventors:
Heinz H Busta, Park Ridge, IL (US);
Robert E Lajos, Crystal Lake, IL (US);
Kul B Bhasin, Schaumburg, IL (US);
Assignee:
Gould Inc., Rolling Meadows, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156626 ; 156643 ; 156655 ; 356364 ; 356368 ; 356381 ; 356382 ;
Abstract
A method and apparatus for detecting the end point of a plasma etching process comprising the use of an optical technique in which light is beamed on the layer to be etched and the resulting beam that is reflected and refracted is detected. Sharply different values of light intensity can be detected when the desired layer is etched and the next layer receives the light beam. A laser is preferably used to obtain an intense and substantially uniform frequency light source.