The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 1980

Filed:

Sep. 20, 1978
Applicant:
Inventor:

Kunio Aomura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
29574 ; 29590 ; 357 59 ; 357 65 ;
Abstract

A method for fabricating a semiconductor device includes the formation of a monitoring element in a substrate. The monitoring element has substantially the same structure and size as a circuit element on the device which is to be monitored. Polycrystalline electrodes are contacted to the semiconductor regions of the monitoring element and extend on an insulating film covering the surface of the substrate. The electrical characteristics of the monitoring element are measured by contacting probes of a measuring apparatus to portions of the polycrystalline electrodes.


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