The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 1980
Filed:
Apr. 20, 1978
Guenther Meusburger, Munich, DE;
Karlheinrich Horninger, Eglharting, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A monolithic integrated circuit arrangement is disclosed which is formed of a group of one-transistor storage elements arranged on a semiconductor layer. Each storage element has a selection field effect transistor and a storage capacitor. The storage elements are arranged in pairs. First and second storage capacitors of each pair are combined to save storage area. In one embodiment, a first conductive coating overlying a surface of the semiconductor layer is employed as a common second electrode for all the storage capacitors. Additional second conductive coatings insulated from the first conductive coating and arranged thereover form the first electrodes for the storage capacitors. In another embodiment a first conductive coating is employed as a common second electrode for the storage capacitors. A second conductive coating is utilized as a first electrode for some of the storage electrodes while an inversion or diffusion layer is utilized as a first electrode for the other storage capacitors. In a final embodiment a first conductive coating over the semiconductor layer is utilized as a common second electrode for all of the storage capacitors. A second conductive coating over the first conductive coating and insulated therefrom is utilized as a first electrode for some of the storage capacitors whereas other storage capacitors have their first electrode formed as an inversion layer adjacent to a shift electrode.