The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 1980

Filed:

May. 19, 1978
Applicant:
Inventors:

Wesley H Verkaart, Lincoln Park, NJ (US);

Edward A Kippel, Suffern, NY (US);

Assignee:

Becton, Dickinson and Company, Rutherford, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61M / ;
U.S. Cl.
CPC ...
12820223 ;
Abstract

The disclosure is of improved 'see-through' or visibly transparent anesthesia masks providing safety by electrical grounding. The improved masks are positively grounded between patient and anesthetic delivery system and may be moved freely on the face of the patient without interruption of the ground circuit. The improvement comprises, as a ground component for contact between an anatomical portion of a patient on which the mask is fitted and the anesthesia delivery system, an electrically conductive spring, resiliently mounted in the mask interior so as to make positive contact with the patient even if the edges of the mask are momentarily raised from sealing contact with the patient's facial parts.


Find Patent Forward Citations

Verkaart, Wesley. (1980). See-through anesthesia mask (U.S. Patent No. 4196727). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4196727

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…