The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 1980
Filed:
Sep. 08, 1978
Ralph J D'Amato, Lancaster, PA (US);
Robert P Stone, Lancaster, PA (US);
RCA Corporation, New York, NY (US);
Abstract
An improvement is provided in an apertured mask type color picture tube having a substantially flat faceplate, a cathodoluminescent screen on the faceplate, a corrugated apertured mask adjacent the screen and electron gun means for producing and directing a plurality of electron beams through the mask to impinge upon the screen. The mask corrugations are substantially parallel and extend in a first direction with the varying corrugated waveform extending in a second direction. The mask includes an aperture width and/or an aperture-to-aperture spacing variation in the second direction which is a function of mask-to-screen spacing. The improvement comprises a further variation in aperture width and/or aperture-to-aperture spacing which is a function of (a) deflection angle of the electron beams, (b) the angle in a horizontal plane between tangents to the mask surface and a central contour through the mask, and (c) the angle in a horizontal plane between a tangent to the mask central contour and a plane perpendicular to the tube central longitudinal axis. In an additional improvement, aperture width also is varied because of the effective mask thickness or aperture step height.