The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 1980
Filed:
May. 01, 1978
Maryse Gazard, Paris, FR;
Jean-Claude Dubois, Paris, FR;
Thomson-CSF, Paris, FR;
Abstract
A process rendering certain electron masking resins more sensitive or rendering polymers which are unsufficiently sensitive to electrons suitable for industrial utilization, in particular for application to electron masking, a method which employs scanning with a very fine electron beam controlled by the computer. The process involves electron irradiation at low dose levels, sufficient however to create free radicals, followed by diffusion of an appropriate copolymerizing monomer by grafting to the initial polymeric chain opened by the irradiation process. The solubility of the copolymer vis-a-vis certain solvents is selective, enabling the masks to be developed.